The Ultratech 2244i was specifically designed as a cost effective approach to complement high NA reduction steppers in a mix-and-match environment, especially for high volume
DRAM and ASIC manufacturing. This system features an ultra-large image field of 22 x 44mm with a 0.32 numerical aperture lens with an illumination bandwidth of 20 nanometers (355 to 375nm). As a result, this system provides 0.8 micron manufacturing capability. These features provide improved critical dimension (CD) interference effects and superior depth-of-focus for the 2244i.

In terms of manufacturing performance, the large field size coupled with an extremely fast and accurate linear motor wafer stage, results in the most productive step-and-repeat lithography tool in the industry at eighty 200mm wafers per hour.

When considering these benefits for cost-of-ownership, the 2244i provides an efficient solution for cost effective mix-and-match lithography with reduction steppers.